发明名称 Plasma processing method and apparatus
摘要 A method and apparatus for processing a target substance by using atmospheric-pressure plasma produced by a composite waveform generated by superimposing a high-frequency sine wave and a high-frequency square wave at the same or substantially the same frequency and at the same or substantially the same phase are provided.
申请公布号 US2005212441(A1) 申请公布日期 2005.09.29
申请号 US20050080550 申请日期 2005.03.16
申请人 CANON KABUSHIKI KAISHA 发明人 YAMAGUCHI KOJI;NISHIGUCHI TOSHIJI
分类号 B01D53/32;B01J19/08;H01J7/24;H05H1/24;(IPC1-7):H01J7/24 主分类号 B01D53/32
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