发明名称 |
Plasma processing method and apparatus |
摘要 |
A method and apparatus for processing a target substance by using atmospheric-pressure plasma produced by a composite waveform generated by superimposing a high-frequency sine wave and a high-frequency square wave at the same or substantially the same frequency and at the same or substantially the same phase are provided.
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申请公布号 |
US2005212441(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
US20050080550 |
申请日期 |
2005.03.16 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
YAMAGUCHI KOJI;NISHIGUCHI TOSHIJI |
分类号 |
B01D53/32;B01J19/08;H01J7/24;H05H1/24;(IPC1-7):H01J7/24 |
主分类号 |
B01D53/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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