| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask whose defect quality can be ensured, while forming a gradation pattern in a small area of pixel size. <P>SOLUTION: The photomask is used to manufacture a fine hemispherical structure, such as a microlens, where a gradation pattern 1A, gradually varying in intensity of exposure light from the center part to the peripheral part according to the spherical shape of the hemispherical structure, is formed on a transparent substrate 10 by pattern drawing by means of a drawing device. Further, the gradation pattern is formed, by arranging light shielding parts 3 and light-transmitting parts 3 of size larger than the resolution limit of a defect inspecting device for the photomask, in a region which is ≤20 μm in diameter or the diagonal length, corresponding to the bottom surface of the hemispherical structure. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
