| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a container for a photoresist composition in which elution of container constituents and occurrence of fine particles from the container constituent are quite low against the photoresist composition including photo-sensitive constituents such as quinonediazido and/or benzophenone, and it has a high aging quality stability and a low contamination characteristic. <P>SOLUTION: This container is constituted such that an average number of fine particles exceeding a particle diameter of 0.3 μm derived from plastic material acting as forming material present in the photoresist after elapsing of storing period of 6 months of the photoresist composition may become 300.0 pieces/mL or less. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
