发明名称 PROCESS AND DEVICE FOR FORMING DISCRETE FINE CAVITY IN FILAMENT WIRE BY USING POLYMER ETCHING MASK
摘要 PROBLEM TO BE SOLVED: To provide a fine cavity forming system appropriately forming fine cavities on an arbitrary surface of a wire. SOLUTION: A system (10) forming the fine cavities in a wire (particularly, tungsten filament wire) has a coating station (20) receiving a wire (14) and applying polymer coating thereto. A mask forming station (40) receives the wire with the polymer coating applied thereto, and forms a mask having air bubbles which form holes in the coating, by blowing wet air on the coating. An etching station (60) receives the polymer-coated wire from the mask forming station (40), applies etching on the wire through the holes in the polymer mask, and forms the fine cavities in the wire. A stripping station (80) removes the polymer mask from the wire, thus, the wire having the fine cavities is manufactured. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005268226(A) 申请公布日期 2005.09.29
申请号 JP20050080758 申请日期 2005.03.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 LIU XINBING
分类号 H01K3/04;C23C16/00;C23F1/02;C23F1/26;H01K3/02;(IPC1-7):H01K3/04 主分类号 H01K3/04
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