发明名称 ION BEAM SEPARATION SYSTEM AND ION BEAM ACCELERATION SYSTEM EQUIPPED WITH IT
摘要 PROBLEM TO BE SOLVED: To place an ion beam separation system linearly in parallel with the orbit of a beam in order to resolve factors causing the upsizing and higher costs of a system due to the larger installation area of a device because the ion separation system uses an analyzing electromagnet of 90°deflection in this system where a conventional ion beam accelerator obtains desired ion beams from polyvalent ion beams emitted from an ion source by an analyzing electromagnet of 90°deflection and a slit placed at stages later than the ion source and accelerates them in an accelerator. SOLUTION: In the ion beam separation system, the ion source, an ion beam convergence means and the slit are linearly placed on the central orbit of the ion beam. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005265429(A) 申请公布日期 2005.09.29
申请号 JP20040073984 申请日期 2004.03.16
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKANISHI TETSUYA;ISHI SADAHIRO
分类号 G21K1/093;G21K1/00;G21K1/02;G21K1/04;H01J37/05;H01J49/30;H05H7/08;(IPC1-7):G21K1/093 主分类号 G21K1/093
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