发明名称 MICRO-NANO PROJECTION STRUCTURE, AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a micro-nano projection structure which can be variously treated and controlled as a unitary element. SOLUTION: A high energy beam is irradiated on a cross sectional area formed by a priority surface of a texture and a surface crossing a priority orientation in the texture of a metallic material, By this operation, the micro-nano projection structure is produced on the cross sectional area the micro-nano projection structure is integrally formed in the shape projecting in the orientation in the priority surface, and is surrounded by a plurality of surfaces equivalent to the priority surfaces in the recrystallization texture of the metallic material, and is composed of the same metal as the metallic material. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005262373(A) 申请公布日期 2005.09.29
申请号 JP20040077577 申请日期 2004.03.18
申请人 NAGOYA KOGYO UNIV 发明人 TANAKA SHUNICHIRO;MIWA HIROTAKA
分类号 B82B1/00;B82B3/00;(IPC1-7):B82B1/00 主分类号 B82B1/00
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