| 摘要 |
An extreme ultraviolet exposure apparatus comprising a light source that emits extreme ultraviolet light, a plurality of illumination reflective mirrors that direct the extreme ultraviolet light emitted from the light source to a mask, a plurality of projection reflective mirrors that direct the extreme ultraviolet light reflected by the mask onto a sensitive substrate and that project and focus an image of the mask on this sensitive substrate, and a projection system optical housing that accommodates at least one of the projection reflective mirrors and at least one of the illumination reflective mirrors.
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