| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device which is capable of generating stable plasma of which control range of work distance is broad under atmospheric pressure, and in which low running cost and high-speed processing can be made compatible. <P>SOLUTION: This device is provided with the main electrodes 5, 31 to be opposed against by pinching a plasma processing space 15. Furthermore, this is provided with a side electrode 6 facing the side faces 5B-1, 5B-2 of the main electrode 5, and a side electrode 32 facing the side faces 31B-1, 31B-2 of the main electrode 5. Therefore, in addition to the plasma processing space 15 in between the main electrode 5 and the main electrode 31, a space in between the side-face of the main electrodes 5, 31 and the side-face electrodes 6, 31 can form an electric field as a preliminary electric discharge regions 16-1, 16-2, and by this electric field, treatment gas in the preliminary electric discharge regions 16-1, 16-2 can be turned into plasma. Electrons and exciton by the plasma generated in the preliminary electric discharge regions 16-1, 16-2 can be supplied directly to the plasma processing space 15. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
