| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the image resolution by narrowing the gap between a mask and a wafer. <P>SOLUTION: By using an unmagnified mask 12 formed so that a plurality of identical patterns 11 may be arranged in one vertical row, X-ray 10 is projected upon one pattern of the mask 12 at the same mgnification. The mask 12 is fixed to a mask stage 13 which is constituted to go back and forth in the lateral direction in a wafer stage 14. In addition, the wafer stage 14 is constituted to go back and forth in the vertical direction in a vertical stage 16. Both the unmagnified mask 12 and wafer 15 are moved upward by means of the vertical stage 16 while the X-ray 10 is projected upon the topmost part of the pattern 11 of the mask 12 at the same magnification. Consequently, the vertical one row portion of the wafer 15 is exposed to a pattern by projecting the X-ray 10 upon the all patterns 11 of one vertical row. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
