发明名称 MEMORY DEVICE CONTAINING PHASE CHANGE MATERIAL, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a memory structure in which electric characteristics are controlled by indirectly heating a phase change material. <P>SOLUTION: A manufacturing method of a memory device of a phase change material and a phase change memory device prepared by the method thereof are included. Concretely, the phase change memory device contains a semiconductor structure, and the semiconductor structure includes a substrate where a first doped area is contained and a set of second doped areas are disposed at both ends thereof; the phase change material disposed on the first doped area; and a conductor disposed on the phase change material. The semiconductor structure is operated as a bipolar junction transistor when the phase change material is in a first phase, and the semiconductor structure is operated as a MOSFET when the phase change material is in a second phase. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005268802(A) 申请公布日期 2005.09.29
申请号 JP20050077513 申请日期 2005.03.17
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 STEPHEN S FURKAY;HENDRICK HAMANN;JOHNSON JEFFREY B;LAM CHUNG H;HON-SUM P WONG
分类号 G11C13/00;G11C11/56;H01L21/06;H01L21/331;H01L27/10;H01L27/105;H01L27/12;H01L27/24;H01L29/00;H01L29/68;H01L45/00 主分类号 G11C13/00
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