EXPOSURE SYSTEM, METHOD OF EXPOSURE, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an exposure system capable of accurately performing alignment processing in liquid immersion exposure.

SOLUTION: The exposure system EX comprises a substrate stage PST that holds a substrate P and is movable, a substrate alignment system 5 that detects an alignment mark 1 on the substrate P held on the substrate stage PST and a reference mark PFM provided on the substrate stage PST, and a mask alignment system 6 that detects a reference mark MFM provided on the substrate stage PST through a projection optical system PL. The reference mark PFM on the substrate stage PST is detected by using the substrate alignment system 5 without the liquid, while the reference mark MFM on the substrate alignment system PST is detected by using the mask alignment system 6 through the projection optical system PL and the liquid. The positional relationship between the reference position detected by the substrate alignment system 5 and the projected position of a pattern image is obtained.

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