| 摘要 |
PROBLEM TO BE SOLVED: To provide a transparent conductive film characterized by low resistance and good surface flatness that is suitable for display elements of the OLED display and to provide a method for manufacturing the transparent conductive film. SOLUTION: When a thin film containing In, Sn and O is formed on a substrate through sputtering using a sputtering target including In, Sn and O and the mixed gas of inert gas and oxygen, the first layer is formed using the oxygen partial pressure higher than the optimal oxygen partial pressure, and then the second layer is formed on the first layer using the optimal oxygen partial pressure to obtain a transparent conductive film where the surface roughness Rs is 0.5 to 2.0 nm, the maximum height Ry is 8 to 20 nm and resistivity is 100 to 250μΩcm. COPYRIGHT: (C)2005,JPO&NCIPI
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