发明名称 METHOD OF MEASURING SHAPE OF HOLE, AND METHOD OF ESTIMATING AREA OF HOLE
摘要 PROBLEM TO BE SOLVED: To quickly and accurately estimate the area of a hole by measuring the shape of the hole of a photomask in a short time. SOLUTION: The direction of the atomic force detected by a probe is set parallel to the scanning direction of the probe. The probe is scanned from a position (a point A), in which force from an internal wall is detected to a position (a point B) in which force from an internal wall facing the internal wall is detected to determined the hole width, on the basis of the scanned distance. Then, the direction of the atomic force detected by the probe is set to be perpendicular to the scanning direction of the probe. While scanning the measurement surface by the probe within a range (from the point B to a point C), in which the atomic force detected by the probe can be controlled to be a constant value, the path of the probe is measured to determine the radius of curvature of a corner section. For other directions and corner sections, the hole width and the radius of curvature are determined similarly, and the area of the hole is calculated from those values. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005265647(A) 申请公布日期 2005.09.29
申请号 JP20040079334 申请日期 2004.03.19
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 ITO YASUTOSHI
分类号 G01B21/20;G01Q10/06;G01Q60/24;(IPC1-7):G01B21/20;G01N13/16 主分类号 G01B21/20
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