| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask defect inspection apparatus which can inspect defects of a mask at once and can easily identify the kinds of defects even when illumination light has shorter wavelengths and even when the mask pattern has larger film thickness. <P>SOLUTION: The apparatus is equipped with an illumination optical system 2 to illuminate various regions of a mask where patterns are formed, an objective lens OL opposing to the mask 4, and at least a pair of detection optical systems 15, 16 having detection sensors 17, 19 to obtain pattern images, respectively, and converging the illumination light from illumination regions different from each other via the objective lens OL, wherein the illumination optical system 2 has an aperture angle controlling means to control the respective aperture angle. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
