发明名称 SURFACE GRAFTING MATERIAL AND METHOD FOR FORMING GRAFT PATTERN USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a surface grafting material useful as a pattern forming material that can form a polymer pattern with high resolution, and a graft pattern forming method that can form a polymer graft pattern with a high resolution using the material. SOLUTION: A substrate is formed which comprises surface grafting polymer chains directly bonded, each at one of the two terminals, to the substrate surface by covalent bonding, wherein the surface grafting polymer chains are covalently bonded to the substrate surface via optically cleavable positions. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005264078(A) 申请公布日期 2005.09.29
申请号 JP20040081482 申请日期 2004.03.19
申请人 FUJI PHOTO FILM CO LTD 发明人 KAWAMURA KOICHI
分类号 G03F7/00;C08F292/00;C08J7/16;(IPC1-7):C08F292/00 主分类号 G03F7/00
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