| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a ferritic thin film in which a production rate in the ferritic film deposited by a ferrite plating method is improved and which has excellent soft magnetic properties and high specific resistance by structural control. SOLUTION: In the method for producing a ferritic thin film, a liquid contact stage where a reaction liquid at least comprising ferrous ions is brought into contact with the surface of a substrate; a film deposition stage where an oxidization liquid at least comprising an oxidizing agent is brought into contact with the surface of the substrate, and a ferrite thin film is deposited on the surface of the substrate brought into contacted with the reaction liquid by a ferrite plating method; and a residue removal stage where residue which does not contribute to the deposition of the ferritic thin film in the reaction liquid and the oxidization liquid is removed from the surface of the substrate are repeated. Further, in the liquid contact stage, as the reaction liquid, many kinds of the ones with different compositions are used, and, in the film deposition stage, the ferritic thin film is deposited in such a manner that the value of Fe/(Fe+Ni+Zn) showing the molar ratio of the Fe content reaches≤2.7/3 (exclusive of zero). COPYRIGHT: (C)2005,JPO&NCIPI
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