发明名称 Lithographic mask holder for e.g. mask recorder, has electrodes that are electrically biased to reduce distances between mask and electrodes by electrical attraction of mask, where mask is attached on holder via electrodes
摘要 The holder (10) has a bearing surface (17a) for laying a lithographic mask (20). Electrodes (13) are electrically biased to reduce distances between a lithographic mask that is placed on the holder and the electrodes by electrical attraction of the lithographic mask. The lithographic mask is attached to the holder through the electrodes. Each electrode shows a voltage connection through which the electrode is biased. Independent claims are also included for the following: (A) a usage of a mask holder in a mask recorder, a lithographic exposure system or in a mask measuring system (B) an arrangement with a mask holder (C) a method for arranging a lithographic mask on a mask holder.
申请公布号 DE102004010002(A1) 申请公布日期 2005.09.29
申请号 DE20041010002 申请日期 2004.03.01
申请人 INFINEON TECHNOLOGIES AG 发明人 KAMM, FRANK-MICHAEL
分类号 G03F1/14;G03F7/20 主分类号 G03F1/14
代理机构 代理人
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