发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION AND OPTICAL WAVEGUIDE |
摘要 |
<p>A photosensitive resin composition for optical waveguide formation which comprises (A) a novolak epoxy resin and (B) a photo-acid generator. The composition is used as, e.g., a material for a core part (5) of an optical waveguide (1). The ingredient (A) in the composition is represented by, e.g., the following general formula (1): (wherein R<1> represents hydrogen or C1-12 alkyl or aralkyl; and n is an integer of 0 to 10). The composition is excellent in suitability for patterning in curing, etc. and gives a cured resin excellent in heat resistance, transmission characteristics, long-term reliability, etc. in the optical waveguide formed.</p> |
申请公布号 |
WO2005091027(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
WO2005JP03418 |
申请日期 |
2005.02.23 |
申请人 |
JSR CORPORATION;UTAKA, TOMOHIRO;TAKASE, HIDEAKI;ERIYAMA, YUUICHI |
发明人 |
UTAKA, TOMOHIRO;TAKASE, HIDEAKI;ERIYAMA, YUUICHI |
分类号 |
C08G59/08;G02B6/12;C08G59/68;G02B6/138;(IPC1-7):G02B6/12 |
主分类号 |
C08G59/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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