发明名称 |
Pattern forming method, arranged fine particle pattern forming method, conductive pattern forming method, and conductive pattern material |
摘要 |
The present invention provides a pattern forming method comprising bonding a compound to a substrate, the compound having both a polymerization initiating moiety capable of undergoing photocleavage to initiate radical polymerization and a substrate bonding moiety, contacting a radical-polymerizable unsaturated compound with the substrate, and exposing light thereto patternwise, so as to form a region where a graft polymer is generated and a region where a graft polymer is not generated. A conductive pattern forming method applying the pattern forming method, and a conductive pattern material obtained by the conductive film forming method.
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申请公布号 |
US2005215721(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
US20050086429 |
申请日期 |
2005.03.23 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
KAWAMURA KOICHI |
分类号 |
C23C18/16;C23C18/28;G03F7/029;G03F7/16;H05K3/18;H05K3/38;(IPC1-7):C08F269/00 |
主分类号 |
C23C18/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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