发明名称 |
METHODS FOR MANUFACTURING REFLECTIVE OPTICAL ELEMENTS, REFLECTIVE OPTICAL ELEMENTS, EUV-LITHOGRAPHY APPARATUSES AND METHODS FOR OPERATING OPTICAL ELEMENTS AND EUV-LITHOGRAPHY APPARATUSES, METHODS FOR DETERMINING THE PHASE SHIFT, METHODS FOR DETERMINING THE LAYER THICKNESS, AND APPARATUSES FOR CARRYING OUT THE METHODS |
摘要 |
The invention relates to a method for manufacturing of a multilayer system (25) with a cap layer system (30), in particular for a reflective optical element for the extreme ultraviolet up to the soft x-ray wavelength range, comprising the steps of: 1. preparing a coating design for the multilayer system (25) with cap layer system (30); 2. coating a substrate (20) with the multilayer system (25) with cap layer system (30); 3. spatially resolved measurement of the coated substrate in terms of reflectance and photoelectron current in at least one surface point; 4. comparison of the measured data with data modelled for different thicknesses of the layers (31, 32, 33) of the cap layer system (30) and/or the layers (21, 22, 23, 24) of the multilayer system (25) for determining of the thickness distribution obtained by the coating; 5. if necessary, adjusting of the coating parameters and repeating steps 2 to 5 until the coated thickness distribution coincides with the design. The invention also relates to further manufacturing methods, reflective optical elements, EUV-lithography apparatuses, and methods for operating optical elements and EUV-lithography apparatuses as well as methods for determining the phase shift, methods for determining the layer thickness, and apparatuses for carrying out the methods. |
申请公布号 |
WO2005091076(A2) |
申请公布日期 |
2005.09.29 |
申请号 |
WO2005EP50985 |
申请日期 |
2005.03.04 |
申请人 |
CARL ZEISS SMT AG;WEDOWSKI, MARCO;SCHOLZE, FRANK;TUEMMLER, JOHANNES |
发明人 |
WEDOWSKI, MARCO;SCHOLZE, FRANK;TUEMMLER, JOHANNES |
分类号 |
G01M11/00;G03F7/20 |
主分类号 |
G01M11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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