发明名称 CERAMIC THIN FILM CAPACITOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a ceramic thin film capacitor not required for being exposed to an electrode at high temperature. SOLUTION: The method for manufacturing a ceramic thin film capacitor 1 has the step of exposing a non-sintered ceramic film 3 under laser irradiation to be sintered for forming a ceramic dielectric layer 2, and the ceramic thin film capacitor 1 has such a structure that the ceramic dielectric layer 2 is pinched between a pair of electrodes 4 and 5. More specifically, this method further comprises the steps of (A) coating a ceramic paste on a lower electrode 4, and next drying the coated paste, thereby forming the non-sintered ceramic film 3 on the lower electrode 4; (B) exposing the non-sintered ceramic film 3 under laser irradiation to be sintered for forming the ceramic dielectric layer 2; and (C) forming an upper electrode 5 on the ceramic dielectric layer 2. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005268508(A) 申请公布日期 2005.09.29
申请号 JP20040078386 申请日期 2004.03.18
申请人 NITTO DENKO CORP 发明人 OKEYUI TAKUJI;MIKI TASUKU;HASEGAWA YUKI;HINO ATSUSHI;AMINO ICHIRO
分类号 H01G4/33;(IPC1-7):H01G4/33 主分类号 H01G4/33
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