发明名称 METHOD AND APPARATUS FOR MEASURING FILM THICKNESS
摘要 PROBLEM TO BE SOLVED: To accurately measure the thickness of a film formed on a substrate. SOLUTION: Data 81 for correction indicating the relation between decrements in the measurement value of a film thickness due to a removal process of organic matter adherent to substrates and the coating weight of organic matter, the difference between a true film thickness and a measurement value caused by the adherent organic matter before the removal process, is stored in a storage part 43 of a control unit 4. A first measurement value of the film thickness of the substrate 9 acquired at a measurement operation part 41 through the use of an ellipsometer 23 at a film thickness measuring apparatus 1. After the organic matter adherent to the substrate 9 is removed by an organic matter removing part 3, a second measurement value affected by remaining organic matter is acquired. The coating weight of the organic matter before the removal process is determined by a film thickness computing part 42 on the basis of the first measurement value, the second measurement value, and the data 81 for correction. The thickness of a membrane formed on the substrate 9 is accurately determined on the basis of the first measurement value and the coating weight of the organic matter before the removal process. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005265418(A) 申请公布日期 2005.09.29
申请号 JP20040073689 申请日期 2004.03.16
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KONO MOTOHIRO;NAKAZAWA YOSHIYUKI;KITAJIMA TOSHIKAZU
分类号 G01B11/06;G01B21/08;H01L21/00;H01L21/66;(IPC1-7):G01B21/08 主分类号 G01B11/06
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