发明名称 Generation of uniformly-distributed plasma
摘要 Methods and apparatus for generating uniformly-distributed plasma are described. A plasma generator according to the invention includes a cathode assembly that is positioned adjacent to an anode and forming a gap there between. A gas source supplies a volume of feed gas and/or a volume of excited atoms to the gap between the cathode assembly and the anode. A power supply generates an electric field across the gap between the cathode assembly and the anode. The electric field ionizes the volume of feed gas and/or the volume of excited atoms that is supplied to the gap, thereby creating a plasma in the gap.
申请公布号 US2005211543(A1) 申请公布日期 2005.09.29
申请号 US20050130315 申请日期 2005.05.16
申请人 CHISTYAKOV ROMAN 发明人 CHISTYAKOV ROMAN
分类号 C23C14/34;C23C14/35;H01J37/32;H01J37/34;(IPC1-7):B01J19/08;B01J19/12 主分类号 C23C14/34
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