发明名称 Multi-layer wiring structure with dummy patterns for improving surface flatness
摘要 A first area, a ring shape second area surrounding the first area, and a third area surrounding the second area are defined on the surface of a support substrate. A first wiring layer is disposed above the support substrate. A wiring is formed in the third area, dummy patterns being formed in the second area, and conductive patterns are not formed in the first area. A functional element is disposed above the first wiring layer and in the first area.
申请公布号 US2005212136(A1) 申请公布日期 2005.09.29
申请号 US20040898167 申请日期 2004.07.26
申请人 FUJITSU LIMITED 发明人 KARASAWA TOSHIYUKI;OTSUKA SATOSHI
分类号 H01L21/3205;H01L21/027;H01L21/768;H01L21/822;H01L23/48;H01L23/52;H01L23/522;H01L27/04;H01L29/00;(IPC1-7):H01L29/00 主分类号 H01L21/3205
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