| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lighting device capable of easily correcting the state when the polarization degree of plane polarization gets worse, while constituting arbitrary modification lighting from the plane polarization of a desired direction, without reducing lighting efficiency; to provide an exposure device with the lighting device; and to provide a manufacturing method using the exposure device. <P>SOLUTION: The lighting device is a lighting system for lighting a mask where a pattern is formed by using the light from a light source. The lighting device comprises a generator for generating the effective light source distribution for carrying out modification lighting of the mask, and a polarization setter for setting a predetermined polarization state to the effective light source distribution. The polarization setter contains a phase converter for changing a phase. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
