| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mirror from which the debris generated from a plasma light source attached to the mirror can be removed without lowering the reflectance of the mirror in an EUV optical system using plasma which prevents the drop of the reflectance even when the mirror is left in the atmosphere. <P>SOLUTION: The mirror which reflects EUV light having a wavelength of ≤60 nm is constituted of a mirror main body and a protective film. Since the refractive index and absorption factor of the material constituting the protective film at the wavelength of the EUV light are adjusted to 0.98-1.02 and ≤0.01 respectively, the surface of the mirror is not oxidized even when the mirror is left in the atmosphere, and the reflectance of the mirror is not influenced even when the debris etc., is removed physically. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
