发明名称 METHOD FOR MANUFACTURING HIGH PURITY DIAMOND PARTICLE, AND HIGH PURITY DIAMOND PARTICLE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing diamond particles for selectively removing impurities, in particular, carbon impurities such as a graphite component, an amorphous carbon component and a straight chain carbon component from diamond particles. <P>SOLUTION: The method for manufacturing diamond particles is characterized in that powder of diamond particles 2 is dispersed and heated in a nitric acid compound solution 24 to remove a carbon impurity layer 6 from the diamond particles 2. With nitrate ions in the nitric acid compound solution 24, impurities deposited on the surface of diamond particles 2, in particular, carbon impurities such as graphite can be removed with high efficiency. When the graphite component is decreased to &le;3% of the diamond component, preferably &le;1.5%, the manufactured high-purity diamond particles 5 can be used for an electric insulator or the like for circuit boards and semiconductors, and used not only for electronic parts but in various fields such as material technology, optics or the like. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005263575(A) 申请公布日期 2005.09.29
申请号 JP20040080092 申请日期 2004.03.19
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY;DAIKEN KAGAKU KOGYO KK;TAKAHAGI TAKAYUKI;SAKAGAMI HIROYUKI 发明人 TAKAHAGI TAKAYUKI;SAKAGAMI HIROYUKI;NIIMIYABARA SHOZO;ISHIKAWA SACHIKO;HARADA AKIO;TOMIMOTO HIROYUKI
分类号 C30B29/04;C01B31/06;C30B33/10 主分类号 C30B29/04
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