RESIST REMOVING APPARATUS FOR MASK SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a resist removing apparatus for a mask substrate capable of highly efficiently removing resist formed on the mask substrate and highly efficiently removing especially the resist formed at four corners of the side surface of the mask substrate and having extremely large thickness. SOLUTION: In the resist removing apparatus for the mask substrate removing the resist on the side surface of the mask substrate by using ozone water, a plurality of nozzles for jetting the ozone water to the nearly entire surface of the side surface of the mask substrate are provided. COPYRIGHT: (C)2005,JPO&NCIPI