| 摘要 |
PROBLEM TO BE SOLVED: To uniformize and shorten the time of development of photoresist in a substrate surface. SOLUTION: For the development of photoresist, a liquid developer is supplied to the substrate while a liquid developer supply nozzle is moved in a specified movement direction. Simultaneously, the liquid developer is sucked from the substrate while a liquid developer recovery nozzle is moved in the same direction behind the liquid developer supply nozzle at a specified interval in the movement direction. Then washing liquid is supplied while a washing liquid supply nozzle is moved in the same direction further behind the liquid developer collection nozzle at a specified interval in the movement direction. COPYRIGHT: (C)2005,JPO&NCIPI |
