发明名称 Etching process for making electrodes
摘要 <p>Substantially transparent electrodes are formed on a substrate by a process including forming on the substrate, in order, a bottom high index layer, a metallic conductive layer, and a top high index layer with a conductivity of at least about 400 Omega/square; and chemically etching the bottom high index layer, the top high index layer and the conductive layer to form discrete electrodes in the metallic conductive layer.</p>
申请公布号 AU2001255383(B2) 申请公布日期 2005.09.29
申请号 AU20010255383 申请日期 2001.04.13
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 JYOTHSNA RAM;NANCY S. LENNHOFF
分类号 C09K13/04;G02F1/1343;H01L21/306;H01L21/3213;H01L31/18;(IPC1-7):H01L031/18 主分类号 C09K13/04
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