发明名称 IMAGING ELEMENT AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an imaging element and a method for manufacturing the same, which can obtain a desired absorption peak wavelength without depending on experimentation and which can equalize the sensitivity of the absorption peak, in the imaging element having a light absorption layer with respect to the depth direction from the surface of the element. SOLUTION: The imaging element is characterized in that the light absorption layer is formed of the material of which the absorption coefficientα(λ) with respect to the light having the wavelengthλis strictly or approximately expressed by an expressionα(λ)=α<SB>0</SB>exp(-βλ), which is formed in a region at X=X<SB>0</SB>(1±γ) from the surface of the element, where X is the depth from the surface of the element, and in which the values of X<SB>0</SB>andγsatisfy an expression (3), with respect to the prescribed absorption peak wavelengthλ<SB>m</SB>. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005265716(A) 申请公布日期 2005.09.29
申请号 JP20040081130 申请日期 2004.03.19
申请人 RITSUMEIKAN 发明人 NUMAI TAKAAKI
分类号 G01J3/50;H01L27/146;H01L31/10;H04N5/335;H04N5/369;(IPC1-7):G01J3/50 主分类号 G01J3/50
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