摘要 |
In a method for multiply exposing at least one substrate coated with a photosensitive layer, a first exposure is carried out in accordance with a first set of exposure parameters on a first projection system ( 17 ), and a second exposure is carried out in accordance with a second set of exposure parameters on a second projection system ( 18 ) spatially separated from the first projection system ( 17 ). The projection systems are integrated in a common projection exposure installation ( 1 ). The first exposure can be carried out, for example, with an amplitude mask ( 6 ), the second exposure with a phase mask ( 9 ). The use of a number of projection systems enables multiple exposure that is performed in parallel and is therefore timesaving.
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