发明名称 |
Complementary metal oxide semiconductor (CMOS) transistors having three-dimensional channel regions and methods of forming same |
摘要 |
An integrated circuit device containing complementary metal oxide semiconductor transistors includes a semiconductor substrate and an NMOS transistor having a first fin-shaped active region that extends in the semiconductor substrate. The first fin-shaped active region has a first channel region therein with a first height. A PMOS transistor is also provided. The PMOS transistor has a second fin-shaped active region that extends in the semiconductor substrate. This second fin-shaped active region has a second channel region therein with a second height unequal to the first height.
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申请公布号 |
US2005215014(A1) |
申请公布日期 |
2005.09.29 |
申请号 |
US20050087988 |
申请日期 |
2005.03.23 |
申请人 |
AHN YOUNG-JOON;PARK DONG-GUN;LEE CHOONG-HO;KANG HEE-SOO |
发明人 |
AHN YOUNG-JOON;PARK DONG-GUN;LEE CHOONG-HO;KANG HEE-SOO |
分类号 |
H01L21/8238;H01L21/336;H01L21/8242;H01L21/84;H01L27/12;H01L29/786;(IPC1-7):H01L21/824 |
主分类号 |
H01L21/8238 |
代理机构 |
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代理人 |
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地址 |
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