发明名称 |
LIGHT IRRADIATION APPARATUS AND METHOD, CRYSTALLIZATION DEVICE AND METHOD, DEVICE, AND LIGHT MODULATION ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a crystallization apparatus which can stably form a desired V-shaped light intensity distribution and can almost uniformly produce crystal grains on a semiconductor film. SOLUTION: The crystallization apparatus includes a light modulation element (1) to modulate a phase of an incident light flux and an imaging optical system (3) to form the V-shaped light intensity distribution on a predetermined surface on the basis of the light flux through the light modulation element. The light modulation element has a complex amplitude transmittance distribution in which a quadratic differential value of a phase value of the complex amplitude distribution becomes almost zero on the bottom portion of the V-shaped light intensity distribution in the image space of the imaging optical system. The complex amplitude transmittance distribution of the light modulation element has a phase modulation no less than a point image distribution range of the imaging optical system. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005268764(A) |
申请公布日期 |
2005.09.29 |
申请号 |
JP20050037840 |
申请日期 |
2005.02.15 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD |
发明人 |
TANIGUCHI YUKIO |
分类号 |
H01L21/20;H01L21/268;H01L21/336;H01L29/786;(IPC1-7):H01L21/268 |
主分类号 |
H01L21/20 |
代理机构 |
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