发明名称 Charged-particle-beam lithographic system
摘要 A charged-particle-beam lithographic system capable of sending data to a data converter in a short time. The system has a library memory for saving a library of graphics data, a writing memory for storing data about the number of reads for reading graphics data from the library memory in succession and other graphics data, a reading processor, and the data converter. The reading processor reads out graphics data saved in the library memory according to data about the number of reads from the writing memory. The converter converts the graphics data in the library and other graphics data into data adapted for the lithographic system. A temporal storage having a higher read speed than that of the library memory is placed between the writing memory and the reading processor.
申请公布号 US2005211928(A1) 申请公布日期 2005.09.29
申请号 US20050087386 申请日期 2005.03.23
申请人 JEOL LTD. 发明人 KUMANO YASUHIRO
分类号 G03F7/20;A61N5/00;G21G5/00;H01J37/302;H01L21/027;(IPC1-7):A61N5/00 主分类号 G03F7/20
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