EXHAUSTING METHOD OF GAS IN APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS SCRUBBER,申请号KR19990004705-传众专利搜索

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发明名称	EXHAUSTING METHOD OF GAS IN APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS SCRUBBER
摘要
申请公布号	KR100517545(B1)	申请公布日期	2005.09.28
申请号	KR19990004705	申请日期	1999.02.10
申请人		发明人
分类号	H01L21/223;(IPC1-7):H01L21/223	主分类号	H01L21/223
代理机构		代理人
主权项
地址

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