发明名称 STEAM OXIDIZATION APPARATUS
摘要 A steam oxidization apparatus capable of providing excellent controllability and reproducibility in the steam oxidation of an oxidized article stored in a reactor by suppressing the condensation of steam in steam entrained inert gas fed to the reactor. The steam oxidation apparatus (78) used when a current constricting structure is formed in a surface emitting laser element by steam- oxidizing a high A1 containing layer comprises the reactor (42) as a reactor device to perform steam oxidization, a steam entrained inert gas system feeding the steam entrained inert gas to the reactor (42), an inert gas system feeding inert gas to the reactor (42), a reactor bypass tube (52) bypassing the steam entrained inert gas system and the inert gas system to the reactor, and an exhaust system exhausting gas exhausted from the reactor (42). The steam oxidation apparatus (78) also comprises an H2O bubbler (60), a second gas tube (68), automatic open/close valves (66A to 66D), a third gas tube (70) near the automatic open/close valves (66A to 66D), and a constant temperature oven (72) storing a part of the reactor (42) on the gas inlet port (42A) side.
申请公布号 KR20050094337(A) 申请公布日期 2005.09.27
申请号 KR20047014720 申请日期 2003.12.26
申请人 SONY CORPORATION 发明人 TANAKA YOSHIYUKI;NARUI HIRONOBU;YAMAUCHI YOSHINORI;WATANABE YOSHIAKI;TANAKA SADAO
分类号 H01L21/31;H01L21/00;H01L21/316;(IPC1-7):H01S5/18 主分类号 H01L21/31
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