发明名称 Monomer having electron-withdrawing group and process for preparing the same
摘要 A monomer containing an electron-withdrawing group of the present invention is represented by following Formula (a), (b) or (c): wherein A<SUP>1</SUP>, A<SUP>2</SUP>, and A<SUP>3 </SUP>are each a ring; R<SUP>a</SUP>, R<SUP>b</SUP>, R<SUP>c</SUP>, and R<SUP>u </SUP>are the same or different and are each a hydrogen atom or organic group; at least one of R<SUP>s</SUP>, R<SUP>w </SUP>and R<SUP>v</SUP>, at least one of R<SUP>t </SUP>and R<SUP>w1</SUP>, and at least one of the two R<SUP>w2</SUP>s are each an electron-withdrawing group, and the others are each a hydrogen atom or organic group; W<SUP>1 </SUP>is a single bond or linkage group; and n denotes an integer of 2 to 25, where at least two of R<SUP>a</SUP>, R<SUP>b</SUP>, R<SUP>c</SUP>, R<SUP>s</SUP>, R<SUP>t</SUP>, R<SUP>u</SUP>, R<SUP>v</SUP>, R<SUP>w</SUP>, R<SUP>w1</SUP>, R<SUP>w2</SUP>, W<SUP>1</SUP>, and carbon atoms constituting ring A<SUP>1</SUP>, carbon atoms constituting ring A<SUP>2</SUP>, and carbon atoms constituting ring A<SUP>3 </SUP>may be combined to form a ring, respectively. The electron-withdrawing groups in R<SUP>s</SUP>, R<SUP>t</SUP>, R<SUP>v</SUP>, R<SUP>w</SUP>, R<SUP>w1</SUP>, and R<SUP>w2 </SUP>are, for example, groups each containing a fluorine atom. The monomer is useful as a raw material for photoresist polymeric compounds.
申请公布号 US6949615(B2) 申请公布日期 2005.09.27
申请号 US20020181830 申请日期 2002.07.23
申请人 DAICEL CHEMICAL INDUSTRIES, LTD. 发明人 INOUE KEIZO
分类号 C07C33/44;C07C35/52;C07C41/01;C07C41/06;C07C41/58;C07C43/192;C07C43/196;C07C43/313;C07C49/755;C07D307/30;C07D307/93;C07D313/10;C07D317/42;C07D339/06;C08F24/00;G03F7/004;G03F7/039;(IPC1-7):C08F114/18 主分类号 C07C33/44
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