摘要 |
A monomer containing an electron-withdrawing group of the present invention is represented by following Formula (a), (b) or (c): wherein A<SUP>1</SUP>, A<SUP>2</SUP>, and A<SUP>3 </SUP>are each a ring; R<SUP>a</SUP>, R<SUP>b</SUP>, R<SUP>c</SUP>, and R<SUP>u </SUP>are the same or different and are each a hydrogen atom or organic group; at least one of R<SUP>s</SUP>, R<SUP>w </SUP>and R<SUP>v</SUP>, at least one of R<SUP>t </SUP>and R<SUP>w1</SUP>, and at least one of the two R<SUP>w2</SUP>s are each an electron-withdrawing group, and the others are each a hydrogen atom or organic group; W<SUP>1 </SUP>is a single bond or linkage group; and n denotes an integer of 2 to 25, where at least two of R<SUP>a</SUP>, R<SUP>b</SUP>, R<SUP>c</SUP>, R<SUP>s</SUP>, R<SUP>t</SUP>, R<SUP>u</SUP>, R<SUP>v</SUP>, R<SUP>w</SUP>, R<SUP>w1</SUP>, R<SUP>w2</SUP>, W<SUP>1</SUP>, and carbon atoms constituting ring A<SUP>1</SUP>, carbon atoms constituting ring A<SUP>2</SUP>, and carbon atoms constituting ring A<SUP>3 </SUP>may be combined to form a ring, respectively. The electron-withdrawing groups in R<SUP>s</SUP>, R<SUP>t</SUP>, R<SUP>v</SUP>, R<SUP>w</SUP>, R<SUP>w1</SUP>, and R<SUP>w2 </SUP>are, for example, groups each containing a fluorine atom. The monomer is useful as a raw material for photoresist polymeric compounds. |