| 发明名称 |
METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE AND DISPLAY |
| 摘要 |
A method for manufacturing a semiconductor device comprises a step wherein wiring is formed by using a first solution jet means which sprays a conductive material, a step wherein a resist mask is formed on the wiring by using a second solution jet means, and a step wherein the wiring is etched by using an atmospheric pressure plasma apparatus having a linear plasma generating means or an atmospheric pressure plasma apparatus having a plurality of plasma generating means arranged linearly while using the resist mask as a mask. |
| 申请公布号 |
KR20050094459(A) |
申请公布日期 |
2005.09.27 |
| 申请号 |
KR20057013571 |
申请日期 |
2004.01.30 |
| 申请人 |
SEMICONDUCTOR ENERGY LABORATORY K.K. |
发明人 |
YAMAZAKI SHUNPEI |
| 分类号 |
H01L21/288;H01L21/336;H01L21/77;H01L21/84;H01L27/28;H01L27/32;H01L29/786;H01L51/00;H01L51/40;H01L51/56;(IPC1-7):H01L21/321;H01L21/28 |
主分类号 |
H01L21/288 |
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