| 摘要 |
A plasma processor comprising a table for mounting an object of processing thereon, a container containing this mounting table and in which plasma is generated by a high-frequency electromagnetic field, a high-frequency oscillator (30) for generating a high-frequency electromagnetic field, and a reference oscillator (34) lower in output power than the high-frequency oscillator (30) and stable in oscillation frequency. A reference signal produced by the reference oscillator (34) is input to the high-frequency oscillator (30) to thereby fix the oscillation frequency of the high-frequency oscillator (30) to the frequency of a reference signal. Therefore, a load matching is effected accurately to improve an energy efficiency when an automatic matching device provided between the high-frequency oscillator (30) and the container is designed based on the frequency of a reference signal.
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