发明名称 ANTISTATIC AGENTS FOR RESINS, ANTISTATIC RESIN COMPOSITIONS, AND MOLDINGS OF ANTISTATIC RESINS
摘要 Antistatic agents for resins, containing phosphonium salts represented by the general formula (1): (1) wherein R1, R2, and R3 are each straight-chain or branched alkyl having 3 to 8 carbon atoms, and R4 is straight-chain or branched alkyl having 10 to 22 carbon atoms, each alkyl being optionally substituted with hydroxyl or alkoxyl; R1, R2, and R3 may be the same or different from each another; and X- is a tetrafluoroborate ion or a hexafluorophosphate ion.
申请公布号 KR20050093788(A) 申请公布日期 2005.09.23
申请号 KR20057011394 申请日期 2005.06.17
申请人 NIPPON CHEMICAL INDUSTRIAL CO., LTD.;NAGASE & CO., LTD. 发明人 KAWAKABE HIROSHI;SUGIYA MASASHI;HARA YOSHIFUSA;ARAI SHIGEYUKI;SAIMARU JIN
分类号 C08K5/00;C08K5/50;C08K7/06;C08L101/00;C09K3/16;(IPC1-7):C08K5/50 主分类号 C08K5/00
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