发明名称 |
ANTISTATIC AGENTS FOR RESINS, ANTISTATIC RESIN COMPOSITIONS, AND MOLDINGS OF ANTISTATIC RESINS |
摘要 |
Antistatic agents for resins, containing phosphonium salts represented by the general formula (1): (1) wherein R1, R2, and R3 are each straight-chain or branched alkyl having 3 to 8 carbon atoms, and R4 is straight-chain or branched alkyl having 10 to 22 carbon atoms, each alkyl being optionally substituted with hydroxyl or alkoxyl; R1, R2, and R3 may be the same or different from each another; and X- is a tetrafluoroborate ion or a hexafluorophosphate ion.
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申请公布号 |
KR20050093788(A) |
申请公布日期 |
2005.09.23 |
申请号 |
KR20057011394 |
申请日期 |
2005.06.17 |
申请人 |
NIPPON CHEMICAL INDUSTRIAL CO., LTD.;NAGASE & CO., LTD. |
发明人 |
KAWAKABE HIROSHI;SUGIYA MASASHI;HARA YOSHIFUSA;ARAI SHIGEYUKI;SAIMARU JIN |
分类号 |
C08K5/00;C08K5/50;C08K7/06;C08L101/00;C09K3/16;(IPC1-7):C08K5/50 |
主分类号 |
C08K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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