发明名称 |
Optical metrology optimization for repetitive structures |
摘要 |
The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top-view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.
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申请公布号 |
US2005209816(A1) |
申请公布日期 |
2005.09.22 |
申请号 |
US20050061303 |
申请日期 |
2005.02.18 |
申请人 |
TIMBRE TECHNOLOGIES, INC. |
发明人 |
VUONG VI;BAO JUNWEI;BISCHOFF JOERG |
分类号 |
G01B3/22;G01B11/24;(IPC1-7):G01B3/22 |
主分类号 |
G01B3/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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