| 摘要 |
PROBLEM TO BE SOLVED: To remove silica dust in H<SB>3</SB>PO<SB>4</SB>solution at low cost and with high efficiency. SOLUTION: H<SB>2</SB>O, for keeping fixed the concentration of the H<SB>3</SB>PO<SB>4</SB>solution, is added immediately in front of a filter film, and the temperature distribution of the H<SB>3</SB>PO<SB>4</SB>solution is made nonuniform. COPYRIGHT: (C)2005,JPO&NCIPI
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