| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holding structure of vapor depositing equipment which can take out a rotating shaft and a bearing pipe from an inside of a reaction tube and easily adjust a location of the substrate without atmosphere entering in the reaction tube. SOLUTION: In vapor depositing equipment 1 which deposits a film of semiconductor crystals on a substrate 18 inside a reaction tube 10, a substrate holding structure 38 holding the substrate 18 is constituted by a drive shaft 40 rotating while being held in sealing support by a magnetic seal rotor 62, by a rotating shaft 46 connected with the drive shaft 40 with a fixing clamp 48, and by a susceptor 66 bearing the substrate 18 in such a manner that it is mounted to the rotating shaft 46 through a bearing pipe 64, and the rotating shaft 46 is threaded in a threading hole 42 of the drive shaft 40, further a rear end of the rotating shaft 46, which is extended into an outside of the vapor depositing equipment 1 through the threading hole 42, is fixed to the drive shaft 40 with the fixing clamp 48. COPYRIGHT: (C)2005,JPO&NCIPI
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