发明名称 MINUTE SAMPLE PROCESSING/OBSERVING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a minute sample processing/observing device and a minute sample processing/observing method, which execute cress section observation and analysis of a wafer cross section from a horizontal direction to a vertical direction without dividing the wafer used as a sample, with high resolution, high precision and high throughput. SOLUTION: This device is provided with a focused ion beam optical system and an electronic optical system in the same vacuum device, and also provided with a probe for separating a minute sample including a desired area of a sample by a charged particle beam forming process, and for extracting the separated minute sample. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005259707(A) 申请公布日期 2005.09.22
申请号 JP20050107008 申请日期 2005.04.04
申请人 HITACHI LTD 发明人 TOKUDA MITSUO;FUKUDA MUNEYUKI;MITSUI YASUHIRO;KOIKE HIDEMI;TOMIMATSU SATOSHI;SHICHI HIROYASU
分类号 G01N1/28;H01J37/20;H01J37/28;H01J37/30;H01J37/317;(IPC1-7):H01J37/28 主分类号 G01N1/28
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