| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid applying apparatus capable of preventing an applying liquid from evaporating when an applying operation is at a stop and reliably preventing the liquid from leaking even when for example, the posture of the apparatus is tilted. SOLUTION: An abutting member 2009 of a liquid holding member 2003 is abutted, under an urging force of a spring 2006, against an applying surface (outer peripheral surface) of an applying roller 1001 which applies an applying liquid to an applying medium P. Thus, a liquid holding space S is formed between the applying roller 1001 and a liquid holding member 2001 to hold the applying liquid. The abutting member 2009 is annularly formed of a single member. The applying roller 1001 rotates to cause the applying liquid held in the liquid holding space S to adhere to an outer peripheral surface of the applying roller 2001 in a layered state while the liquid is regulated by the abutting member 2009 and the applying liquid is then applied to the applying medium P. COPYRIGHT: (C)2005,JPO&NCIPI
|
