发明名称 VACUUM VAPOR-DEPOSITION APPARATUS AND METHOD OF PRODUCING VAPOR-DEPOSITED FILM
摘要 A vacuum deposition apparatus and a vapor-deposited film manufacturing method for manufacturing vapor- deposited film by forming a vapor-deposited layer on the surface of material film. In the vacuum deposition apparatus, a synchronization means (18) sets the outer peripheral velocity v1 of a coating roll (14) and the outer peripheral velocity v2 of a feed-out side guide roll (15) to v1 = v2 so that the vapor-deposited layer on the surface of the vapor- deposited film is not rubbed against the feed-out side guide roll (15). Thus, the possibility of damage to the vapor-deposited layer can be eliminated to provide a sufficient performance to the vapor-posited layer.
申请公布号 KR20050092724(A) 申请公布日期 2005.09.22
申请号 KR20057012013 申请日期 2003.12.26
申请人 TOPPAN PRINTING CO., LTD.;APPLIED FILMS GMBH & CO. KG 发明人 SASAKI NOBORU;SUZUKI HIROSHI;KOIZUMI FUMITAKE;IMAI NOBUHIKO;ARAI KUNIMASA;KONAGAI HIROYUKI
分类号 C23C14/56;(IPC1-7):C23C14/56;C23C16/54 主分类号 C23C14/56
代理机构 代理人
主权项
地址