发明名称 |
VACUUM VAPOR-DEPOSITION APPARATUS AND METHOD OF PRODUCING VAPOR-DEPOSITED FILM |
摘要 |
A vacuum deposition apparatus and a vapor-deposited film manufacturing method for manufacturing vapor- deposited film by forming a vapor-deposited layer on the surface of material film. In the vacuum deposition apparatus, a synchronization means (18) sets the outer peripheral velocity v1 of a coating roll (14) and the outer peripheral velocity v2 of a feed-out side guide roll (15) to v1 = v2 so that the vapor-deposited layer on the surface of the vapor- deposited film is not rubbed against the feed-out side guide roll (15). Thus, the possibility of damage to the vapor-deposited layer can be eliminated to provide a sufficient performance to the vapor-posited layer.
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申请公布号 |
KR20050092724(A) |
申请公布日期 |
2005.09.22 |
申请号 |
KR20057012013 |
申请日期 |
2003.12.26 |
申请人 |
TOPPAN PRINTING CO., LTD.;APPLIED FILMS GMBH & CO. KG |
发明人 |
SASAKI NOBORU;SUZUKI HIROSHI;KOIZUMI FUMITAKE;IMAI NOBUHIKO;ARAI KUNIMASA;KONAGAI HIROYUKI |
分类号 |
C23C14/56;(IPC1-7):C23C14/56;C23C16/54 |
主分类号 |
C23C14/56 |
代理机构 |
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