发明名称 |
THIN-FILM FORMING DEVICE, PHOTOELECTRIC CONVERTER AND THIN-FILM MANUFACTURING METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a thin-film forming device that can manufacture more high-quality thin film efficiently, a photoelectric converter that is manufactured by the thin-film forming device, and a thin-film manufacturing method by which more high-quality thin film can be efficiently manufactured. <P>SOLUTION: A plasma CVD device uses a ladder-like electrode 13 as an electrode to generate plasma for decomposing a deposition gas. The ladder-lie electrode 13 is arranged at a position where it is nearly parallel to a substrate K, not being in contact therewith, and a distance between the substrate K and itself is 10 mm or less, at least during deposition. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005259853(A) |
申请公布日期 |
2005.09.22 |
申请号 |
JP20040067009 |
申请日期 |
2004.03.10 |
申请人 |
MITSUBISHI HEAVY IND LTD;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
KUREYA MASAYUKI;YAMASHITA NOBUKI;YONEKURA YOSHIMICHI;KONDO MICHIO;MATSUI TAKUYA |
分类号 |
C23C16/509;H01L21/205;H01L31/04;(IPC1-7):H01L21/205 |
主分类号 |
C23C16/509 |
代理机构 |
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地址 |
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