| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a real-time control system of a composition for a lithography process using a near-infrared spectroscope and a method for controlling the same. <P>SOLUTION: The system includes a composition transport device that draws out a composition in a tank 10 that stores compositions used in a lithography process, and then transports the composition into the tank 10 that further stores compositions through a flow cell 70; a composition analyzer that measures the absorbance of the composition passing through the flow cell 70, and calculates the concentration of each component of the composition using the measured absorbance; an insufficient-component adding/supplying device for adding an insufficient additive liquid into a tank, when concentration of the measured, one component is lower than a predetermined value; and a control part that controls the insufficient-component adding/supplying device according to the components of the composition analyzed by the composition analyzer to adjust the concentration of each component of the composition. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
