| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photoresist composition capable of forming both a high density pattern and an isolated pattern with good profiles even when an ultrafine resist pattern is formed. <P>SOLUTION: The positive photoresist composition contains (A) an alkali-soluble novolac resin including an m-cresol unit represented by formula (I) and/or formula (II), a 3,4-xylenol unit represented by formula (III), and a 2,3,5-trimethylphenol unit represented by formula (IV), and (B) a naphthoquinonediazido ester compound of a specified phenol compound. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
